Electrically pumped h-BN single-photon emission in van der Waals heterostructure
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Content
Introduction
p1
- defects in quantum technologies
- defects in 2d materials, quantum circuitries
- example of defects in 2d materials (hBN), SPE, quantum communication
- challenges, optical pumping, difficulties in manipulation in integrated structures
p2
- advantages in electrical excitation
- advatnages when incorporating with 2d materials (van der waals materials)
- more details of electrical excitation, mechanisms of charge carriers injection
- good but not implemented, emphasizing the innovative points (electrical pumped, hBN, SPEs, isolated defect)
p3
- devices they proposed, can achieve SPE in hBN, atomically thin
- brief structure of devices (hetero- van der waals junction, NbSe2/hBN/graphene), electrical pumping
- some properties, photon emission intensity scales linearly with the applied current, antibunching natures in HBT configuration
- advantages of heterojunction configuration, enabling stable defect emission, other characterization of photon emission (photon energies, polarization) but not sure why heterojunction can allow this, very special? hard in other configuration?
- brief conclusion, outlook of the electrically pumped hBN SPE, potential applications in compact devices, chip-based quantum information
Results and dicussion
p1
- device configuration
- defect formation in hBN
- high temperature annealing with O2 gas flow to high purity hBN crystal
- additional pristine hBN space layer is placed between defective hBN and top NbSe2 as part of sequential transfer of multilayer stacking (just for stacking? dont know whats for)
- details go to SI
- again, how electrical pumping works for emission
p2
- chosen of electrode materials in heterostructure, NbSe2 and graphene, asymmetric junction, efficient charge carriers injection
- minimal overlapping of two electrodes, confining the path of tunneling current flow to go through the defects
- reducing the number of participating defects in tunneling current flow can stabilize photon emission
p3
- electroluminescence measurement details, 6.5 K, varying voltage
- Figure 1b, electrically induced emission spectrum, description of experiments, some devices details (hBN spacer thickness and defective hBN thickness)
- trend of intensity change with increasing applied voltage
- CCD image Figure 1c, white light source, identify graphene, NbSe2 by their boundaries, localized EL center (with EL mapping image)
p4
- more specific comparison of EL spectrum, 0 V and 28 V
- emission peaks 1.5 2.8 2.9 eV, ZPLs of single defects
- 2.6 eV is phonon sideband of 2.8 eV, reference longitudinal optical phonon of hBN
- 1.5 eV free of separate phonon sideband
- some have sideband some have not, originate from layered structure (vdW interaction?), with reference
- asymmetric ZPL with higher spectral weight toward low energy side, originated from low-energy acoustic phonon sidebands (i.e. low freq phonon contribution to boardening/sideband) or the voltage induced peak broadening
p5
- focus more on 1.5 eV ZPL
- high resolution spectra of 1.5 eV ZPL, showing in Figure 2a 2b, showing threshold voltage 26 V
- emission intensity and tunneling current as functions of voltage Figure 2c, intensity scale linearly with current, with same threshold voltage
- above finding suggests tunneling current is induced by defect-mediated charge transport directly contributing to the charge carrier supply at the emitter site (not very understandable, assuming intensity - current is linearly related?)
- linear relation between tunneling current and emission intensity, even for less stable emissters (intermittent blinking), positive correlation between current and intensity still existed, indicating emissions are driven by current flow
- emphasize again the correlation between current and emission intensity is a strong piece of evidence of charge transport through a single defect, which is a distinct behavior enabled by van der Waals device
p6
- looking deeper into the voltage dependent emission, a Stark shift is foudn in Figure 2a, representing out-of plane dipole
- width increases with voltage in Figure S4
- peak broadening is explained by the increase of injection current, enhancing the charge carriers in the vicinity of defect site, field fluctuation by surrouding mobile charges
- field fluctuation coupled to the increase dipole mement with voltage, resulting in the inhomogeneous broadening of emission peaks
- Figure S4, inhomogenous broadening is more pronounced toward the low energy side as voltage increases, unlink optically excited hBN
- however the minimal linewidth increasement is only 2 meV by measurement, still comparable to most optically excited hBN and electricaly excited emitters in other solid state systems
p7
- single photon emission properties, confirmed by second order correlation function measurement
- Figure 2d, g2tau
- g2tau data description, g2(0) = 0.25 +- 0.21 quantum nature
- width of tip 18.2 +- 7.2 ns, longer than typical lifetimes from optically excited hBN (a few ns)
- longer lifetime comes from the distinctive transition process associated to electrical excitation
- current injuection supplies carriers to defect site across the bandgap, highly probable include charge-trapping level during the excitation process, thus slower transition process
- more details of transition mechanism in SI
p8
- g2tau photon count rate ~700 cps with current level 6 nA
- total measurement time about 25 h gives the conincidence count event number of 75 at a large time delay
- photon emission count rate is smaller than other electrically excited SPE in bulk host materials but comparable to other ultrathin crystals
- assume high threshold voltage prevent the increase of the applied voltage, resulting in a moderate injuection current
- but some fabricated devices may have lower threshold, expect preparing cleaner interfaces, improving contact quality can decrease threshold, enhance the emitter intensity and scalability
p9
- check the dipole axis direction of emitter by the polarization-resolved measurement in Figure 2e
- fitting the polar plot of the angle-resolved emission intensity with $ I(\theta) = A cos^2(\theta-\theta_0)+B $, $\theta$ is the polarization angle of the emitted light measured relative to the high symmetry axis of hBN crystal, find $\theta_0 = 60\degree$
p10
- emission wavelength and intensity showed good instability as a funciton of time, Figure 2f
- emission intensity, generally persistent value, a few intermittent brightening
- another emitter better stability in terms of intensity, Figure S3, lower voltage (23 V)
- analyzing the blinking statistics by recording the emission on and off events, to know the intermittent brightening, Figure S6
- from above, extracted the effect of surrounding itinerant mobile charges is a dominant origin of the intensity fluctuation
p11
- SI section 6, summarize the number of emitters in 4 devices
- more than 30 emitters in device 1 through electrical pumping, good stability.
- other than emitter in Figure 1, some emitters were created with applied voltage above 60 V on the same device, Figure S7
- several reasons of such high voltage created defect levels
- existing defect levels may changed by the voltage-induced charge injection, or new sites be created by breaking B-N bonding
- the possible mechanisms of defects creation under high voltage suggests, local electrical pulse at the device level could be applied to controllably activate emission centers for defect creations
p12
- emission energy with positive and negative voltage, to understand the charge supply mechanism of the heterostructure, Figure 3
- two characteristics
- number of emitters far exceeds at positive than negative bias
- high photon energies, most emitters are observed under the application of positive voltages with only a few exception
p13
- observation of different voltage bias align with the band diagram
- work function of graphene 4.5 eV and NbSe2 5.9 eV, without bias, the heterostructure creates a built-in tilting in hBN, Fermi level of NbSe2 becomes closer to the hBN VBM
- applying finite volatge, current flow supplies electrons and holes into the defect sites, photon emission
- the current flow luminescence processs occurs more efficiently under a positive bias, because NbSe2 is a hole metal, preferentially provides hole carriers for the tunneling current
- holes from NbSe2 and electrons from graphene allow stable generation of photons
- negative voltage, electron are less supplied, more pronounced for emitters with higher transition energies
p14
- with information of polarization axis, wavelength, can categorize emitters into three groups, could have distinct cyrstallographic structures, Figure 4
- long wavelength group with energy 1.4-1.7 eV, middle wavelength group with energy 1.9-2.4 eV, short wavelength group with energy 2.4-3.0 eV
- different groups show characteristic photon energy, shape of phonon sideband, polarization dependence, implying different origins
p15
- group 1 small phonon sidebands, randomized distribution of polarization axis
- oxygen related defect, from emission energy range and shape of spectrum
- the abundance of group 1 emitters may result from the oxygen-flow annealing during fabrication
- using argon-annealing, strikingly constrasting emitter distribution is found in Figure S8
- highlights the accessibility of EL probe oxygen-related defectst in hBN
- group 3 phonon sidebands 160 meV apart from ZPL, linear polarization axes generally separated by a 60deg interval
- polarization axis is particularly more concentrated at 120deg, could be result of the uniaxial strain frequently foudn in layered materials
- polarization dependence agress with the recently reported emitteres induced by e-beam irradiation, carbon ion implantation
- suggest group 3 may originiate from carbon-related color center
- group 2 wide range of variation in both spectral shape and polarization distribution
- short outlook, need more research to understand
Conclusion
- demonstrate all electrical generation of SPE in hBN, van der Waals integrated devices scheme
- combination of graphene and NbSe2, asymmetric deivce structure, stable generation of photon emission in a wide range of spectral windows, allowing studies on various types of emitters
- aniticipate, expand research on 2d materials in heterostructure involving hBN defects, will promote funtionality and applicability of van der Waals quantum optoelectronics
- outlook integrable single photon sources in ultrathin materials, electrical excitation capabilities, may achieve electrically driven quantum communication, spin defect operations